Liquid crystal display and manufacturing method for the same

ABSTRACT

The present invention is related in upper glass, liquid crystal display panel, liquid crystal projector and method for liquid crystal display panel, more specifically, upper glass which is entering light is improved a ratio for aperture using semiconductor etching process. According to the present invention comprises transparent substrate which is transparent light; first thin film which is opposite opaque area on lower substrate make said transparent substrate; second thin film which is making around said first thin film on transparent substrate and thick film is equal density for said second thin layer and make on the said first thin film and said second thin film.

TECHNICAL FIELD

The present invention relates to an upper substrate, liquid crystaldisplay panel, liquid crystal projector, and manufacturing method forthe same, and more specifically, to an upper substrate, liquid crystaldisplay panel, liquid crystal projector, and manufacturing method forthe same for increasing an aperture ratio by directly forming a lens onthe upper substrate on which light of the liquid crystal display panelis incident, through the application of a semiconductor etching processwithout a process of attaching another micro lens array.

BACKGROUND ART

An aperture ratio of a display element such as a liquid crystal displaypanel is a very important factor to determine performance, and showsdegrees of light that is transmitted in the liquid crystal displaypanel. Since a display element having a high aperture ratio has a widerarea for passing the light, the display element can be more brightlydisplayed than a display element having a low aperture ratio. Thus, whenusing display elements having the same size and resolution, the displayelements having a high aperture ratio can drive a lamp with lower powerconsumption than the other display element having a low aperture ratio,thereby implementing desired brightness.

In addition, when displaying a bright color, a more similar color to anactual color can be displayed due to excellent brightness, therebyincreasing elegant images.

The liquid crystal display panel composed of many pixels locates a lightcut-off unit between the pixels or a place where a thin film transistoris located, thus it increases contrast and prevents a leakage currentfrom being generated in a channel unit of the thin film transistor. Thatis, the liquid crystal display panel prevents the leakage current frombeing generated in a thin film transistor channel owing to heat energyor light energy itself generated by the incident light. However, thewider an area of the light cut-off unit gets, the smaller acorresponding aperture ratio gets, causing display itself to darken.

To solve these problems, a method of gathering light into an aperturewith micro lenses has been suggested, by attaching a micro lens array tothe liquid crystal display panel in order to increase opticaltransmissivity.

FIG. 1 is a plane figure relating to a liquid crystal display panelwhere micro lenses are formed, according to prior art. Referring to FIG.1, the process will be described as follows.

An Micro Lens Array(MLA) is formed on an area corresponding to an entiredisplay screen. The micro lens array forms each micro lens(1) everyupper part of pixels(3) to which light is transmitted, and locates lightcut-off areas(2) such as a wiring unit and a black matrix between themicro lens(1).

FIG. 2 is a sectional view relating to a liquid crystal display panel byFIG. 1. Referring to FIG. 2, the process will be described as follows.

Micro lenses(1) used in a micro lens array refract light transmitted tolight cut-off units(2) with pixels(3) by using positive convex lenses,thereby improving brightness. However, the micro lenses(1) are seenround shapes or nearly round shapes on a 2-dimensional plane. Thus, likeshown in FIG. 1, spaces that do not cover the lenses are formed betweenthe micro lenses(1), and the transmitted light is not refracted in thesespaces. As a result, there is a limit to improve screen luminance.

There can be two methods of manufacturing the liquid crystal displaypanel to which the micro lens array is attached.

First, an opposite substrate is completed by making a glass surface ofthe opposite substrate into an embossing surface with the use of asemiconductor photoetching process, and covering and polishing coverglass after coating the embossing surface with a refractive index ofglass and other resin and smoothing the embossing surface. The oppositesubstrate has about tens of micrometers in thickness by the abovepolishing process.

Second, a molding method is used as follows. A first resin is hardenedwith the use of UV rays by coating the first resin on a glass substrateand pressurizing a location where micro lenses are formed with a molder.Then, the opposite substrate is completed by covering and polishing thecover glass after coating a second resin having a different refractiveindex from that of the first resin and hardening the second resin withthe use of the UV rays.

A structure of the liquid crystal display panel in the first case ismade from the opposite substrate-resin-cover glass-transparentelectrode-alignment layer-liquid crystal. A structure in the second caseis made from the opposite substrate-resin-resin-cover glass-transparentelectrode-alignment layer-liquid crystal.

According to the above manufacturing method, a manufacturing cost can beexpensive because of a complicated manufacturing process. Furthermore,since both methods use at least one resin, it is possible to change itsproperties by light incident from a light source.

The hardening process is required because the resin is used, and theliquid crystal display can be transformed during the manufacturingprocess, since the resin itself has physically weak hardness.

In addition, since the process is performed from the oppositesubstrate-resin-cover glass in order, a sawing process only with a highcost in a cutting process can be usable.

In a prior micro lens manufacturing process, the cover glass should beattached in order to adjust the focal distance of the lenses andpolished in regular thickness, thereby requiring a complicated process.

As a result, problems of the process and the manufacturing cost wereserious due to such prior structure and the process.

DISCLOSURE OF INVENTION

It is an object of the present invention to provide the upper substrate,the liquid crystal display panel, the liquid crystal projector andmethod for manufacturing liquid crystal display panel.

The present invention makes aperture ratio 100% achieved and efficiencyin light usage is improved, and forms lens on at least part of oppositesubstrate corresponding to wiring unit which cuts off light and thenchange path of light which is incident to wiring unit.

To achieve the above object, in upper substrate for a liquid crystaldisplay panel in accordance with the present invention,

-   -   an upper substrate of a liquid crystal display panel,        comprising: a transparent substrate through which light passes;    -   a first thin film, said film installed in a location        corresponding to a light cut-off area of a lower substrate of        the liquid crystal display panel on top of the transparent        substrate, and having a concave shape in the middle;    -   a second thin film, said film installed on the transparent        substrate and around the first thin film; and a thick film, said        film having same density as the second thin film, and said film        installed on the first thin film and the second thin film.

Said thick film is composed of many thin film layers.

In addition, to solve the above object, in a liquid crystal displaypanel in accordance with the present invention,

-   -   a lower substrate, comprising a light transmitting area and a        light cut-off area composed of a black matrix, and a wiring to        which a signal is applied, an upper substrate which is opposite        to the lower substrate and combined at regular cell gaps, and a        liquid crystal filled between the lower substrate and the upper        substrate,    -   wherein the upper substrate comprising: a transparent substrate        through which light passes;    -   a first thin film, said film installed in a location        corresponding to the light cut-off area of the lower substrate        on the transparent substrate, and said film having a concave        shape in the middle;    -   a second thin film, said installed around the first thin film on        the transparent substrate;    -   and a thick film, said having the same density as the second        thin film, and said film installed on the first thin film and        the second thin film.

In addition, to achieve the above object, in a liquid crystal projectorto display for using liquid crystal display panel in accordance with thepresent invention, In a liquid crystal projector for displaying by useof a liquid crystal display panel, the liquid crystal display panelcomprising:

-   -   a lower substrate comprising, a light transmitting area and a        light cut-off area composed of a black matrix, and a wring to        which a signal is applied;    -   an upper substrate, said substrate being opposite to the lower        substrate, and combined at regular cell gaps; and a liquid        crystal filled between the lower substrate and the upper        substrate;    -   wherein the upper substrate comprising:    -   a transparent substrate through which light passes; a first thin        film, said film installed in a location corresponding to the        light cut-off area of the lower substrate on the transparent        substrate, and having a concave shape in middle; a second thin        film, said film installed around the first thin film on the        transparent substrate; and a thick film, said film having same        density as the second thin film, and installed on the first thin        film and the second thin film.

In addition, to achieve the above object, in manufacturing method for aupper substrate liquid crystal display panel in accordance with thepresent invention comprising;

-   -   a first step of, forming a first thin film on a transparent        substrate, patterning the first thin film to have regular        intervals, forming a second thin film having a bigger refractive        index than that of the first thin film between the regular        intervals, and smoothing an upper part thereof;    -   a second step of, coating upper parts of the first thin film and        the second thin film with a photoregister, exposing the        photoregister by using a photo mask, and patterning a middle        part of the photoregister located on the second thin film in        concave shape;    -   a third step of, etching the first thin film and the second thin        film where the photoregister is patterned, and etching the        second thin film in the same shape as the photoregister; and    -   a fourth step of, forming a thick film by coating the upper        parts of the etched second thin film and the first thin film        with same material as the second thin film, and smoothing an        upper part of the thick film.

In addition, to achieve the above object, in manufacturing method for aliquid crystal display panel in accordance with the present inventioncomprising;

-   -   a first step of, forming a first thin film on a transparent        substrate, patterning the first thin film to have regular        intervals, forming a second thin film having a bigger refractive        index than that of the first thin film between the regular        intervals, and smoothing an upper part thereof;    -   a second step of, coating upper parts of the first thin film and        the second thin film with a photoregister, exposing the        photoregister with the use of a photo mask, and patterning a        middle part of the photoregister located on the second thin film        in concave shape;    -   a third step of, etching the first thin film and the second thin        film where the photoregister is patterned, and etching the        second thin film in same shape as the photoregister;    -   a fourth step of, forming a thick film by coating the upper        parts of the etched second thin film and the first thin film        with same material as the second thin film, and smoothing an        upper part of the thick film; and    -   a fifth step of, installing a transparent electrode and an        alignment layer on the thick film;    -   wherein the manufactured upper substrate is combined with a        lower substrate, said substrate having a wiring for changing an        electric field at regular cell gaps;    -   and, wherein a liquid crystal is injected between the upper        substrate and the lower substrate.

BRIEF DESCRIPTION OF DRAWINGS

FIG. 1 is a plane figure relating to a liquid crystal display panelwhere micro lenses are formed, according to prior art.

FIG. 2 is a sectional view relating to a liquid crystal display panel byFIG. 1.

FIG. 3 a through FIG. 3 f are diagrams illustrating a manufacturingprocess of an upper substrate used in a liquid crystal display panel inaccordance with the present invention.

FIG. 4 a through FIG. 4 d are diagrams illustrating one embodiment of amethod for manufacturing an upper substrate of a liquid crystal displaypanel in accordance with the present invention.

FIG. 5 is a structure chart illustrating a structure of one embodimentof a liquid crystal display panel having improved transmissivity inaccordance with the present invention.

DESCRIPTION OF REFERENCE NUMERALS IN THE DRAWINGS

10: upper substrate 11: n₁ thin film

13: transparent electrode 14: alignment layer

17: thick film 20: liquid crystal layer

30: lower substrate 31: alignment layer

32: transparent electrode 33: light cut-off area

BEST MODE FOR CARRYING OUT THE INVENTION

The present invention will now be described more fully hereinafter withreference to the accompanying drawings, in which preferred embodimentsof the invention are shown.

FIG. 3 a through FIG. 3 f are diagrams illustrating a manufacturingprocess of an upper substrate used in a liquid crystal display panel inaccordance with the present invention. Referring to FIG. 3 a throughFIG. 3 f, the process will be described as follows.

n₂ thin films(12) having certain intervals are formed on manytransparent substrates by being deposited and patterned on thetransparent substrates. Then, an n₁ thin film(11) is formed between then₂ thin films(12). At this time, the n₂ thin films(12) can be formed inlamination shape of thin films whose stress is crossed in + and −directions. A location where the n₁ thin film(11) is formed correspondsto a part where a light cut-off area of a lower substrate in the liquidcrystal display panel is located (FIG. 3 a).

A photoregister(16) is deposited on the n₂ thin films(12) and the n₁thin film(11) and is developed to form a groove where thephotoregister(16) gets thicker, as the photoregister(16) on the n₁ thinfilm(11) goes to a periphery from a part located in the middle of the n₁thin film(11), with a photo mask(FIG. 3 b). The size of the grooveshould not exceed horizontal length of the n₁ thin film(11), to preventthe photoregister(16) located on the n₂ thin films(12) from beingetched. When the certain-shaped groove is formed in thephotoregister(16), make the groove shape formed in the photoregister(16)on the n₁ thin film(11) by etching the groove. In this case, ananisotropic etching should be performed. The anisotropic etching has abigger etching speed in length direction than an etching speed inhorizontal direction, thereby implementing directional dependency on theetching speed. The groove formed on the n₁ thin film(11) by thisanisotropic etching has a deep center, and makes the n₁ thin film(11)thicker as going toward the periphery(FIG. 3 c).

After completing the above etching process, deposit a thick film(17)having certain thickness by removing the remainingphotoregister(16)(FIG. 3 d).

The thick film(17) is formed by using materials composed of n₂ thinfilms and materials having the same refractive index values. With aCVD(Chemical Vapor Deposition) method, the thick film(17) configureslayers composed of the n₂ thin films. In case of the n₂ thin films ofthe thick film(17), each layer is deposited to crossly have oppositestress properties. The layers have tensile and compressive stressproperties.

The reason why tensile stress is crossed with compressive stress is asfollows. When the thick film(17) having single stress is deposited, atransparent substrate gets bent. By crossly transforming stress of eachlayer laminated on the thick film(17), the forces between the layers canbe reciprocally buffered, thereby preventing the transparent substratefrom being bent by the thick film(17).

Depositing multi-layer thin films as crossing stress each other can beaccomplished by controlling deposition conditions such as gas densityand temperature at the time when the thin films are generated. And,smooth an upper part of the thick film(17). Thick film is not stressedby transparent substrate.(FIG. 3 e).

Then, deposit a transparent electrode(13) on the thick film(17), andcomplete an upper substrate(10) of the liquid crystal display panel bydepositing an alignment layer(14) on the transparent electrode(13).

Combine the completed upper substrate(10) with a lower substrate(30) atregular cell gaps, and form a liquid crystal layer(20) between the uppersubstrate(10) and the lower substrate(30) by injecting a liquid crystal.Then, the liquid crystal display panel is completed(FIG. 3 f).

The lower substrate(30) comprises: a thin film transistor formed on atransparent substrate; a wiring unit transmitting a signal for changingan electric field given to a liquid crystal to the thin film transistor;a black matrix(33) cutting off light from being irradiated to the wiringunit; a transparent electrode(32) giving the electric field to a liquidcrystal layer by being opposite to a transparent electrode of an uppersubstrate; and an alignment layer(31) formed on the transparentelectrode and maintaining a certain arrangement in the liquid crystal. Alight cut-off area cuts off the light by forming the black matrix(33). Alight transmitting area is the other area except the light cut-off area.

Since a retractive index of materials forming the thick film(17) is thesame as that of the liquid crystal or similar to the liquid crystal, apath of the light is not refracted on a boundary between the thickfilm(17) and the liquid crystal layer(20). Then n₁ thin film(11)performs a role of a lens refracting the light and determines arefractive index of the n₁ thin film(11), to prevent the light passingthrough an upper part of the n₁ thin film(11) from being irradiated onthe light cut-off area located in a lower part of the n₁ thin film(11)by being refracted on a boundary between the n₁ thin film(11) and thethick film(17). Therefore, the refractive index of the n₁ thin film(11)should be bigger than that of the n₂ thin films(12).

In order to prevent the light refracted on a boundary between the n₁thin film(11) and the n₂ thin films(12) from being irradiated on thelight cut-off area such as the black matrix or the wiring unit of thelower substrate, the light cut-off area should be separated from the n₁thin film(11) at a certain distance. The distance is determined bydifferences between the refractive indexes of the n₁ and the n₂ thinfilms, and is controlled with thickness of the deposited thick film(17).

Supposing an angle created between the light incident on the liquidcrystal display panel and a boundary of the n₁ thin film and the thickfilm(17) is Θ, a refractive angle refracted on the boundary is Θ′, andrefractive indexes between the n₁ thin film and the n₂ thin films are n₁and n₂, respectively, and defining a distance up to the light cut-offfilm from the middle of the n₁ thin film is D and width of the lightcut-off film is 2L, then defining a minimum angle irradiated on thelight transmitting area by being refracted on the boundary between then₁ thin film and the n₂ thin films is α, without the light incident fromthe middle of the n₁ thin film being bumped against the light cut-offarea, the following formula is obtained. $\begin{matrix}{{{n_{1}\sin\quad\theta} = {n_{2}\sin\quad\theta^{\prime}}}{\theta^{\prime} = {\theta + \alpha}}{{\tan\quad\alpha} \geq \frac{L}{D}}} & \lbrack {{Formula}\quad 1} \rbrack\end{matrix}$

Thus, according to the formula 1, thickness of the thick film isdetermined by D length, thickness of the liquid crystal layer and therefractive index of the thick film, and the refractive index of the n₁thin film. It is desirable that the refractive index of the thick filmis within a range of 1.4 to 1.6.

Generally, forming the thick film takes much time and large-sizedequipments. However, the thick film can be simply deposited by using amethod of generating ultra corpuscle through an aerosol process with theuse of high frequency inductive heating source, sending the ultracorpuscle, and accumulating the ultra corpuscle with a vacuum chamberfor accumulating the ultra corpuscle.

Corpuscle aerosols are generated by heating and evaporating metalmaterials through a high frequency inductive heating process, amonginactive gases pressurized by water pressure in a chamber for generatingcorpuscle. The corpuscle have tens of nanometers in size, approximately.And, the corpuscle aerosols are sent to the vacuum chamber and aresprayed as sonic aerosols through minute nozzles having tens ofmicrometers in diameter. The corpuscle are accelerated at about 900 mevery second. At this moment, kinetic energy of the particles isconverted into heat energy, causing a local sintering phenomenon. As aresult, the thick film is formed at high speed.

Also, it is possible to shape various patterns or inclined functionstructures under control of a 3-dimensional precise vacuum stage or bymixing and switching the sent particles, as well as remove a portion orthe entire lamination film with the use of laser.

FIG. 4 a through FIG. 4 d are diagrams illustrating one embodiment of amethod for manufacturing an upper substrate of a liquid crystal displaypanel in accordance with the present invention. Referring to FIG. 4 athrough FIG. 4 d, the process will be described as follows.

Many n₂ thin films(22) having certain intervals are formed on atransparent substrate by being deposited and patterned on thetransparent substrate. After that, an n₁ thin film(21) is formed betweenthe n₂ thin films(22). A boundary between the n₂ thin films(22) and then₁ thin film(21) is inclined with a predetermined angle, thereby makingthe n₁ thin film in a reverse trapezoid shape (FIG. 4 a).

Then, a photoregister(26) is deposited on the n₂ thin films(22) and then₁ thin film(21) and is developed by forming a groove where thephotoregister(26) gets thicker, as the photoregister(26) on the n₁ thinfilm(21) goes to a periphery from a part located in the middle of the n₁thin film(21), with the use of photo mask(FIG. 4 b). The size of thegroove should not exceed horizontal length of the n₁ thin film(21), toprevent the photoregister(26) located on the n₂ thin films(22) frombeing etched.

When the certain-shaped groove is formed in the photoregister(26), makethe groove shape formed in the photoregister(26) on the n₁ thin film(21)by etching the groove. In this case, an anisotropic etching should beperformed. The groove formed on the n₁ thin film(21) by this anisotropicetching has a deep center, and makes the n₁ thin film(21) thicker asgoing toward the periphery(FIG. 4 c).

After completing the above etching process, deposit and smooth a thickfilm(27) having certain thickness by removing the remainingphotoregister(26)(FIG. 4 d).

Then, complete the upper substrate of the liquid crystal display panelin the same way as described in FIG. 3, and complete the liquid crystaldisplay panel by injecting a liquid crystal after the upper substratecoheres with the lower substrate.

FIG. 5 is a structure chart illustrating a structure of one embodimentof a liquid crystal display panel having improved transmissivity inaccordance with the present invention. Referring to FIG. 5, the processwill be described as follows.

When a refractive index(n₁) of a lens material is smaller than anaverage refractive index(n₂) of a liquid crystal(50), a lens(41) has aconic shape whose middle part is convex like shown in the diagram. Thecone-shaped lens(41) is formed on an upper substrate opposite to a lowersubstrate in which a light cut-off film(42) and a pixel(43) areinstalled.

Also, by locating the light cut-off film(42) on the lower substrateopposite to a location where the lens(41) of the upper substrate isformed, it is possible to irradiate light to the pixel by refracting thelight irradiated to the light cut-off film(42)

Defining that width of the light cut-off film(42) is 2L, an incidentangle is Θ and a refraction angle is Θ′, a distance to the lens(41) fromthe light cut-off film(42) is D, height of the lens(41) is d, a distanceto an opposite substrate from the light cut-off film(42) is t, and aminimal angle at which the light incident from the middle of thelens(41) passes by changing a path in order not to be bumped into thelight cut-off film(42) is α, the following formula 2 can be obtained.$\begin{matrix}{{{n_{1}\sin\quad\theta} = {n_{2}\sin\quad\theta^{\prime}}}{\theta^{\prime} = {\theta + \alpha}}{{{\tan\quad\alpha} \geq \frac{L}{D}} = \frac{L}{t - d}}} & \lbrack {{Formula}\quad 2} \rbrack\end{matrix}$

Since an n₁ value is smaller than an n₂ value, the size of therefraction angle Θ′ gets smaller than the incident angle Θ, therebyrefracting the incident light to a pixel area(43). Therefore, if theliquid crystal display panel satisfies the formula 2, it is available toimprove transmissivity of the liquid crystal display panel having anideal 100% aperture ratio.

A process for protruding the lens is performed as follows. First, coatthe substrate with a lens resin. It is desirable to use a photosensitiveresin for the lens resin. However, if not the photosensitive resin,perform a patterning process by using a semiconductor photoregister.

After the patterning, the residual lens resin is formed by correspondingto a wiring unit, the light cut-off film or a TFT channel unit of thelower substrate. Thus, the lens can be directly formed on the substratewithout attaching layers of the lens to the substrate aftermanufacturing the lens layers, thereby simplifying the process andsolving lens align problems.

In addition, the residual lens resin should have an incline planethrough development or strip process. After obtaining the incline plane,perform a heat treatment process.

Inorganic materials or oxide films can be used as lens materials, and inthis case, it is possible to form the lens through a generalphotoetching semiconductor process.

And, since an orientation of the liquid crystal may be disturbed by thelens protruded on the opposite substrate(upper substrate), it isdesirable to coat and smooth a resin having a different refractive indexfrom the lens or an inorganic material, so that the resin or theinorganic material have the same height as the lens.

Also, it is possible to more clearly display an image by manufacturing aliquid crystal projector with the use of the liquid crystal displaypanel in accordance with the present invention.

INDUSTRIAL APPLICABILITY

According to an upper substrate, liquid crystal display, liquid crystalprojector, and a method for manufacturing the liquid crystal displaypanel in accordance with the present invention, it is possible toincrease an aperture ratio of the liquid crystal display panel with muchlight through pixels, by refracting the light irradiated to an areawhere the light is not transmitted and irradiating the refracted lightto areas such as the pixels where the light is transmitted.

Then, misalign phenomenon can be prevented by locating the lens forrefracting the light on the upper substrate of the liquid crystaldisplay. Thus, it can increase efficiency of a light source bymagnifying light efficiency, thereby reducing heat generated from thelight source with the use of the light source having low powerconsumption. As a result, it prevents deterioration of projectorperformance as well as defects.

Furthermore, it can increase display quality by reproducing the samecolor as the actual color with a process of manufacturing display havingexcellent luminance.

And, it is unnecessary to use a cover glass used to adjust the focaldistance of the lens, enabling a simple manufacturing process withoutanother materials. Accordingly, a manufacturing cost can be cheaper withreduced raw materials, as well as the liquid crystal projector can beinexpensive.

This invention may, however, be embodied in different forms and shouldnot be construed as limited to the embodiments set forth herein. Rather,these embodiments are provided so that this disclosure will be thoroughand complete, and will fully convey the scope of the invention to thoseskilled art.

1. An upper substrate of a liquid crystal display panel, comprising: atransparent substrate through which light passes; a first thin filminstalled in a location corresponding to a light cut-off area of a lowersubstrate of the liquid crystal display panel on top of the transparentsubstrate, and having a concave shape in the middle; a second thin filminstalled on the transparent substrate and around the first thin film;and a thick film having substantially the same density as the secondthin film, and said thick film is installed on the first thin film andthe second thin film.
 2. The upper substrate of claim 1, wherein thethick film is comprised of many thin film layers.
 3. The upper substrateof claim 2, wherein many thin films comprising the thick film areinstalled by crossing stress polarity thereof.
 4. The upper substrate ofclaim 1, wherein the thick film removes stress from the upper substrate.5. The upper substrate of claim 1, wherein the first thin film has apredetermined inclination on a boundary with the second thin film.
 6. Aliquid crystal display panel comprising: a lower substrate, comprising alight transmitting area and a light cut-off area composed of a blackmatrix, and a wiring to which a signal is applied, an upper substratewhich is opposite to the lower substrate and combined at regular cellgaps, and a liquid crystal material between the lower substrate and theupper substrate, wherein the upper substrate comprises: a transparentsubstrate through which light passes; a first thin film installed in alocation corresponding to the light cut-off area of the lower substrateon the transparent substrate, and said first thin film having a concaveshape in the middle; a second thin film around the first thin film onthe transparent substrate; and a thick film having substantially thesame density as the second thin film, and said thick film installed onthe first thin film and the second thin film.
 7. The liquid crystaldisplay panel of claim 6, wherein the thick film is comprised of manythin film layers.
 8. The liquid crystal display panel of claim 7,wherein thin films of the thick film are installed by crossing stresspolarity thereof.
 9. The liquid crystal display panel of claim 6,wherein the first thin film has a predetermined inclination on aboundary with the second thin film.
 10. The liquid crystal display panelof claim 6, wherein refractive indexes of the thick film and the liquidcrystal are substantially the same.
 11. A liquid crystal projector fordisplaying by use of a liquid crystal display panel, the liquid crystaldisplay panel comprising: a lower substrate comprising a lighttransmitting area and a light cut-off area composed of a black matrix,and a wiring to which a signal is applied; an upper substrate disposedopposite to the lower substrate, and combined at regular cell gaps; anda liquid crystal material between the lower substrate and the uppersubstrate; wherein the upper substrate comprises: a transparentsubstrate through which light passes; a first thin film installed in alocation corresponding to the light cut-off area of the lower substrateon the transparent substrate, and having a concave shape in middle; asecond thin film installed around the first thin film on the transparentsubstrate; and a thick film having substantially the same density as thesecond thin film, and installed on the first thin film and the secondthin film.
 12. The upper substrate of claim 11, wherein the thick filmis composed of many thin film layers.
 13. The liquid crystal projectorof claim 12, wherein thin films of the thick film are installed bycrossing stress polarity thereof.
 14. The liquid crystal projector ofclaim 11, wherein the first thin film has a predetermined inclination ona boundary with the second thin film.
 15. A method of manufacturing anupper substrate, comprising: a first step of forming a first thin filmon a transparent substrate, patterning the first thin film to haveregular intervals, forming a second thin film having a larger refractiveindex than that of the first thin film between the regular intervals,and smoothing an upper part thereof; a second step of coating upperparts of the first thin film and the second thin film with aphotoresist, exposing the photoresist by using a photo mask, andpatterning a middle part of the photoresist located on the second thinfilm in concave shape; a third step of etching the first thin film andthe second thin film where the photoresist is patterned, and etching thesecond thin film in substantially the same shape as the photoresist; anda fourth step of forming a thick film by coating the upper parts of theetched second thin film and the first thin film with substantially thesame material as the second thin film, and smoothing an upper part ofthe thick film.
 16. The method of claim 15, wherein a refractive indexof the first thin film is smaller than that of the second thin film. 17.The method of claim 15, wherein the thickness of the thick film isdetermined by ${\tan\quad\alpha} \geq \frac{L}{D}$ and a refractiveindex of both the thick film and the first thin film.
 18. The method ofclaim 15, wherein the thick film is comprised of multi layered thinfilms.
 19. The method of claim 18, wherein stress directions arealternately applied to the thick film.
 20. A method for manufacturing aliquid crystal display panel, said method comprising: manufacturing anupper substrate of the liquid crystal display panel, wherein said methodcomprising: a first step of forming a first thin film on a transparentsubstrate, patterning the first thin film to have regular intervals,forming a second thin film having a larger refractive index than that ofthe first thin film between the regular intervals, and smoothing anupper part thereof; a second step of coating upper parts of the firstthin film and the second thin film with a photoresist, exposing thephotoresist with the use of a photo mask, and patterning a middle partof the photoresist located on the second thin film in concave shape; athird step of etching the first thin film and the second thin film wherethe photoresist is patterned, and etching the second thin film in sameshape as the photoresist; a fourth step of forming a thick film bycoating the upper parts of the etched second thin film and the firstthin film with same material as the second thin film, and smoothing anupper part of the thick film; and a fifth step of installing atransparent electrode and an alignment layer on the thick film; whereinthe upper substrate is combined with a lower substrate, said substratehaving a wiring for changing an electric field at regular cell gaps;and, wherein a liquid crystal material is disposed between the uppersubstrate and the lower substrate.
 21. The method of claim 20, wherein arefractive index of the thick film is between approximately 1.4 to 1.6.22. A liquid crystal display element having improved permeability,comprising: a lower substrate laminated by many TFT electrodes a pixelelectrode and an alignment layer; an opposite substrate disposedopposite to the lower substrate and laminated by an opposite electrode aprojection-type lens and an alignment layer, and wherein theprojection-type lens is located opposite to a light cut-off film of thelower substrate; and a liquid crystal material between the lowersubstrate and the opposite substrate.